Foils
Ion Beam Stripping Diamond Foil

Foils
Ion Beam Stripping Diamond Foil

Foils
Boron Doped Diamond Foil

Foils
Boron Doped Diamond Foils

Diamond Foils

Specifications

Fabrication

Films are initially deposited using microwave plasma assisted chemical vapor deposition on silicon wafers as ultrananocyrstalline, nanocrystalline, or microcrystalline diamond by varying selected deposition parameters including gas composition, nucleation, power, substrate temperature, and pressure. Subsequently the diamond is separated from the original substrate and applied either to new substrates or to frames. These substrates can be three-dimensional and the foils can be wrapped around them. The separation of deposition and application processes provides the opportunity to apply diamond thin films to substrates at room temperature.

Applications

References