Electrically Conductive Diamond Electrodes
Specifications
- Boron-doped diamond films
- Substrates materials from titanium, tungsten, niobium, silicon
- Diameter up to 75 mm
- Transparent electrodes on glass
- Microelectrodes
- Conducting powders
- Shaping by laser cutting
Fabrication
Boron-doped diamond films are grown by microwave plasma assisted chemical vapor deposition. Due to the large variety of potential applications the material has to be synthesized on many different substrate materials (i.e. metals and silicon) and substrate geometries and dimensions (i.e. flat plates, discs, pins, and wires). The differences in thermal expansion between substrate material and diamond film at typical process temperatures of 700°C requires a careful design of the diamond thin film layering to prevent intrinsic residual stress induced material failures.
Applications
Boron-doped polycrystalline diamond thin films exhibit unique properties, which make them an excellent electrode material for electrochemical applications:
- Water treatment (destruction of inorganic and organic pollutants, disinfection)
- Electrochemical analysis
- Bioelectrochemistry
- Electrosynthesis
- Energy storage and conversion
References
- R. Ramamurti, M. Becker, T. Schuelke, T. Grotjohn, D. Reinhard, G. Swain and J. Asmussen, Boron doped diamond deposited by microwave plasma-assisted CVD at low and high pressures, Diamond and Related Materials, 17 (2008) 481-485
- M. A. Lowe, A. E. Fischer and G. M. Swain, Formation of Crack-Free and Debonding-Resistant Boron-Doped Diamond Thin Film on Titanium Using a Dual Coating Strategy, J. Electrochem. Soc., 2006, 153, B506
